Please use this identifier to cite or link to this item: http://dspace2020.uniten.edu.my:8080/handle/123456789/5777
Full metadata record
DC FieldValueLanguage
dc.contributor.authorWong, Y.H.en_US
dc.contributor.authorAffendy, M.G.en_US
dc.contributor.authorLau, S.K.en_US
dc.contributor.authorTeh, P.C.en_US
dc.contributor.authorLee, H.J.en_US
dc.contributor.authorTan, C.Y.en_US
dc.contributor.authorRamesh, S.en_US
dc.date.accessioned2017-12-08T07:24:52Z-
dc.date.available2017-12-08T07:24:52Z-
dc.date.issued2017-
dc.description.abstractElectrochemical anodisation is a well-received method in the complementary metal-oxide-semiconductor field as it is advantageous; best performed at room temperature which translates into being more affordable and a simple alternative to form nano-structured oxide films for different metals. The quintessential parameters involved allow numerous formations of metal oxide films according to desired morphology and thickness. Therefore, this paper aims to review the effects of anodising parameters such as applied voltage, concentration, temperature, time, current density and post-anodisation annealing among them. © 2016 Institute of Materials, Minerals and Mining.en_US
dc.language.isoen_USen_US
dc.relation.ispartofVolume 33, Issue 6, 13 April 2017, Pages 699-711en_US
dc.titleEffects of anodisation parameters on thin film properties: a reviewen_US
dc.typeArticleen_US
dc.identifier.doi10.1080/02670836.2016.1193654-
item.cerifentitytypePublications-
item.languageiso639-1en_US-
item.fulltextNo Fulltext-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.grantfulltextnone-
item.openairetypeArticle-
Appears in Collections:COE Scholarly Publication
Show simple item record

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.