Please use this identifier to cite or link to this item: http://dspace2020.uniten.edu.my:8080/handle/123456789/21588
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dc.contributor.authorSobayel K.en_US
dc.contributor.authorNurhafiza K.en_US
dc.contributor.authorAkhtaruzzaman M.en_US
dc.contributor.authorAyob A.en_US
dc.contributor.authorAmin N.en_US
dc.date.accessioned2021-12-21T03:10:35Z-
dc.date.available2021-12-21T03:10:35Z-
dc.date.issued2019-
dc.identifier.urihttp://dspace2020.uniten.edu.my:8080/handle/123456789/21588-
dc.description.abstractPhysical Vapor Deposition (PVD) was used to grow ultra-thin tungsten di sulfide (WS2) layers on top of soda lime glass substrates. Deposition power of radio frequency magnetron sputtering was varied (50W, 100 W, 150 W,200 W and 250 W) to study its impact on film characteristics for suitable application in solar cell. Structural, morphological and opto-electrical properties of as grown film were analyzed. Optimized monocrystalline ultra-thin WS2 films of enhance crystallite (690 nm thick) were successfully hoarded with RF power of 150 W under 100°C temperature. © 2019 IEEE.en_US
dc.language.isoenen_US
dc.titleInvestigating the impact of deposition power on pvd growth ws2 for solar cell applicationen_US
dc.typeconference paperen_US
item.cerifentitytypePublications-
item.languageiso639-1en-
item.fulltextWith Fulltext-
item.openairecristypehttp://purl.org/coar/resource_type/c_5794-
item.grantfulltextopen-
item.openairetypeconference paper-
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