Please use this identifier to cite or link to this item: http://dspace2020.uniten.edu.my:8080/handle/123456789/21545
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dc.contributor.authorLow F.W.en_US
dc.contributor.authorLai C.W.en_US
dc.contributor.authorAsim N.en_US
dc.contributor.authorAkhtaruzzaman M.en_US
dc.contributor.authorAlghoul M.en_US
dc.contributor.authorTiong S.K.en_US
dc.contributor.authorAmin N.en_US
dc.date.accessioned2021-12-21T02:46:54Z-
dc.date.available2021-12-21T02:46:54Z-
dc.date.issued2019-
dc.identifier.urihttp://dspace2020.uniten.edu.my:8080/handle/123456789/21545-
dc.description.abstractA study investigating the effects of titanium (Ti)atoms sputtered from different sources on substrate distance was attempted in order to effectively dope a reduced graphene oxide (rGO)thin film surface. Factors such as crystallinity, morphology, phase formation, light absorption, and surface chemical state of rGO-TiO2 were investigated. As a result, functional groups or chemical states revealed the presence of Ti-O-C in rGO-TiO2 nanocomposite after the sputtering process. The titanium source from the target was of Ti3+ species as determined using X-ray photoelectron spectroscopy (XPS). It was found that average sized Ti3+ ions of around 59.4 nm were incorporated into the rGO nanosheet. A customized Dye-Sensitized Solar Cells (DSSCs)device was fabricated with the photo-anode consisting of sputtered rGO-TiO2 nanocomposite. After optimization, the Ti target allocated with 10 cm-apart FTO glass-coated rGO nanosheet and 0.67 cm2 active area exhibited an ideal PCE of 6.60%, which is remarkably higher than the usual 5 cm sputtering distance the sample (1.90%)had achieved. © 2019en_US
dc.language.isoenen_US
dc.titleAn investigation on titanium doping in reduced graphene oxide by RF magnetron sputtering for dye-sensitized solar cellsen_US
dc.typearticleen_US
item.cerifentitytypePublications-
item.languageiso639-1en-
item.fulltextWith Fulltext-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.grantfulltextopen-
item.openairetypearticle-
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