Browsing by Subject Gate dielectrics
Showing results 1 to 1 of 1
Issue Date | Title | Author(s) |
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2016 | Influence of Optimization of Process Parameters on Threshold Voltage for Development of HfO2/TiSi2 18 nm PMOS | Atan, N. ; Ahmad, I. ; Majlis, B.Y. ; Azle, M.F. |