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Issue Date | Title | Author(s) |
2010 | Analyze and optimize the silicide thickness in 45nm CMOS technology using Taguchi method | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. |
2011 | Analyze of input process parameter variation on threshold voltage in 45nm n-channel MOSFET | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. ; Elgomati, H.A. ; Majlis, B.Y. |
2011 | Application of Taguchi method in the optimization of process variation for 32nm CMOS technology | Elgomati, H.A. ; Majlis, B.Y. ; Ahmad, I. ; Salehuddin, F. ; Hamid, F.A. ; Zaharim, A. ; Apte, P.R. |
2010 | Characterization and optimizations of silicide thickness in 45nm pMOS device | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. |
2011 | Cobalt silicide and titanium silicide effects on nano devices | Elgomati, H.A. ; Majlis, B.Y. ; Salehuddin, F. ; Ahmad, I. ; Zaharim, A. ; Hamid, F.A. |
2006 | Effect of moisture on underfill interfacial adhesion and packages flexural strength in flip chip packaging | Endut, Z. ; Ahmad, I. ; Zaharim, A. ; Sukemi, N.M. |
2010 | Effect of process parameter variations on threshold voltage in 45nm NMOS device | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. |
2011 | Effects of different catalytic activation techniques on the thermal performance of flip chip heat spreader | Lim, V. ; Amin, N. ; Foong, C.S. ; Ahmad, I. ; Zaharim, A. ; Rasid, R. ; Jalar, A. |
2011 | Employability skills for an entry-level engineer as seen by Malaysian employers | Yuzainee, M.Y. ; Zaharim, A. ; Omar, M.Z. |
2009 | Employability skills framework for engineering graduate in Malaysia | Zaharim, A. ; Yusoff, Y.M.D. ; Omar, M.Z. ; Basri, H. |
2012 | Employability skills performance score for fresh engineering graduates in Malaysian industry | Md Yusoff, Y. ; Omar, M.Z. ; Zaharim, A. ; Mohamed, A. ; Muhamad, N. |
2009 | Employers' selection skills in recruiting fresh engineering graduates | Md Yusoff, Y. ; Zaharim, A. ; Omar, M.Z. ; Mohamed, A. ; Muhamad, N. ; Mustafa, R. |
2013 | Employment preference for university of fresh engineering graduates | Yuzainee, M.Y. ; Rahmat, R.A.O.K. ; Zaharim, A. |
2010 | Enhancing employability skills through industrial training programme | Yusoff, Y.M. ; Omar, M.Z. ; Zaharim, A. ; Mohamed, A. ; Muhamad, N. ; Mustapha, R. |
2012 | Impact of different dose and angle in HALO structure for 45nm NMOS device | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. |
2010 | Impact of HALO structure on threshold voltage and leakage current in 45nm NMOS device | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. |
2011 | Influence of HALO and source/drain implantation on threshold voltage in 45nm PMOS device | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. |
2011 | Optimization of HALO structure effects in 45nm p-type MOSFETs device using taguchi method | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. ; Elgomati, H.A. ; Majlis, B.Y. ; Apte, P.R. |
2011 | Optimization of input process parameters variation on threshold voltage in 45 nm NMOS device | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. ; Hashim, U. ; Apte, P.R. |
2011 | Optimization of process parameter variability in 45 nm PMOS device using Taguchi method | Salehuddin, F. ; Ahmad, I. ; Hamid, F.A. ; Zaharim, A. |